Equipment by Keywords
To reserve equipment time, or to view more information about an equipment, click on the equipment name. Visit the Equipment Rates page for our equipment rate schedule.
| Keyword | Name | Status |
|---|---|---|
| 3D Printing | Objet 3D Printer | In Use |
| Dicing/Bonding | Dicing Saws- ADT | Available |
| Dicing/Bonding | K&S 4124 Ball Bonder, Gold Ball | Down |
| Dicing/Bonding | K&S 4700 Wedge Bonder (Staff Run) | Available |
| Dicing/Bonding | Wafer Bonder, EVG 501 | Available |
| Electron Microscopy/Microanalysis | Cameca SX Five FE EPMA | Available |
| Electron Microscopy/Microanalysis | EDAX EDS/EBSD on FEI Helios NanoLab 600i dual beam | Available |
| Electron Microscopy/Microanalysis | FIB/SEM - FEI Helios G4 PFIB CXe dual beam | Available |
| Electron Microscopy/Microanalysis | FIB/SEM - FEI Helios NanoLab 600i dual beam | Available |
| Electron Microscopy/Microanalysis | FIB/SEM - Thermo Fisher Scios 2 dual beam | Available |
| Electron Microscopy/Microanalysis | S/TEM - FEI Talos F200i | Available |
| Electron Microscopy/Microanalysis | S/TEM - FEI Tecnai F20 | Down |
| Electron Microscopy/Microanalysis | S/TEM - FEI Themis Z | Down |
| Electron Microscopy/Microanalysis | SEM - FEI Nova 430 w/EDS & CL | Available |
| Electron Microscopy/Microanalysis | SEM - Hitachi S-3000 | Down |
| Electron Microscopy/Microanalysis | SEM - Tescan MIRA3 | Available |
| Film Deposition | ALD - Cambridge Nano Fiji 200 | Available |
| Film Deposition | ALD - Veeco Fiji 200 | In Use |
| Film Deposition | E-beam evaporator, PVD | Available |
| Film Deposition | PECVD - STS 310PC SiO2 - SiN - Amorphous Si | Available |
| Film Deposition | PECVD - Unaxis 790 PECVD | Available |
| Film Deposition | SCS Parylene Coater | Down |
| Film Deposition | Sputter Deposition, AJA - STAFF ONLY | Available |
| Film Deposition | Sputter Deposition, Evatec Clusterline 200 | Available |
| Film Deposition | Sputter Deposition, KJL CMS-18 Multi-Source | Available |
| Film Deposition | Sputter Deposition, TFE Batch Vertical PVD | Down |
| Hot Processing | Furnace Tube, Thermcraft, General Hot Process | Available |
| Hot Processing | Furnace Tube, Tystar #1 Wet and dry Ox | Available |
| Hot Processing | RTA, SSI Solaris 150 | Available |
| Hot Processing | RTA, Steag 100CS RTP | Down |
| Metrology | 4 Point Probe Station | Available |
| Metrology | Bruker Optical Profilometer | Available |
| Metrology | Electronic Measurement, Lakeshore 7507 | Available |
| Metrology | Ellipsometer, J.A. Woolam | Available |
| Metrology | Flexus 2320 | Available |
| Metrology | Horiba microRaman | Available |
| Metrology | Nikon LV100 Microscope | Available |
| Metrology | Photospectrometer, Filmetrics F40 | Available |
| Metrology | Profilometer, Dektak XT | Available |
| Metrology | Profilometer, Tencor AS500 | Available |
| Metrology | SEM - JEOL 5700 | Available |
| Metrology | Zeiss Microscope | Available |
| Other | Dessicator | Available |
| Other | PDMS Process Tools - Room 235 | Available |
| Other | PDMS-Spinner | Available |
| Other Analytical Techniques | Rheometer - ARES LS1 | Available |
| Particle Analysis/Characterization | Coulter LS13320 | Available |
| Particle Analysis/Characterization | Malvern Zetasizer Ultra | Available |
| Particle Analysis/Characterization | TSI PSD 3603 (Aerosizer) | Down |
| Photolithography | Heidelberg Laser Writer | Available |
| Photolithography | Litho Process BSC-100 Spinner | Available |
| Photolithography | Litho Process EVG Model 620 w/BSA | Available |
| Photolithography | Litho Process Karl Suss MA6 | Available |
| Photolithography | Litho Process Laurell Litho Bay & Hot Plate/Oven | Available |
| Photolithography | Litho Process Laurell Spinner E-Beam Bay & Hot Plate/Oven | Available |
| Photolithography | Litho Process Suss Delta 20 & Hot Plate | Available |
| Photolithography | Litho Process Suss Delta 80 & Hot Plate/Oven | Available |
| Photolithography | Oven, YES, Image Reversal/HMDS | Available |
| Photolithography | Raith 150, e-beam lithography | Available |
| Plasma | Asher - Anatech Barrel SCE600 | Available |
| Plasma | Asher - Tepla M4L | Available |
| Plasma | DRIE - Deep RIE, STS | Down |
| Plasma | DRIE - Oxford Plasma Pro | Available |
| Plasma | RIE - Unaxis 790 RIE | Available |
| Plasma | RIE/ICP - Trion | Down |
| Plasma | RIE/ICP - Unaxis SLR | Available |
| Porosimetry/Porometry/Surface Area | Autosorb iQ - Analysis (Ar, CO2, He) | In Use |
| Porosimetry/Porometry/Surface Area | Autosorb iQ - Krypton | Available |
| Porosimetry/Porometry/Surface Area | Autosorb iQ - Outgassing (monitor) | In Use |
| Porosimetry/Porometry/Surface Area | Quantachrome PoreMaster Mercury Porosimeter | Available |
| Porosimetry/Porometry/Surface Area | Quantachrome Porometer 3g zh | Available |
| Sample Preparation | Allied Multi-prep Lapping and Polishing system | Available |
| Sample Preparation | Coater - Carbon | Available |
| Sample Preparation | Coater - Hummer V Au-Pd | Available |
| Sample Preparation | Coater - SPI Au-Pd | Available |
| Sample Preparation | Labconco Triad Freeze Dryer | Available |
| Sample Preparation | Struers Tegramin 30 Polisher | Available |
| Spectroscopy | FTIR/FTIR Microscope - ThermoFisher iS50 | Available |
| Spectroscopy | Horiba microRaman | Available |
| Spectroscopy | SEM - FEI Nova 430 w/EDS & CL | Available |
| Spectroscopy | UV/Vis - Perkin-Elmer Lambda 800 | Available |
| Surface Analysis/Characterization | Bruker Optical Profilometer | Available |
| Surface Analysis/Characterization | Ellipsometer, J.A. Woolam | Available |
| Surface Analysis/Characterization | Perkin-Elmer PHI 660 - AES | Available |
| Surface Analysis/Characterization | SPM/AFM Dimension 3100 | In Use |
| Surface Analysis/Characterization | XPS - ULVAC-PHI XPS | Available |
| Wet Processing | Amerimade Bench BOE/HF | Available |
| Wet Processing | Amerimade Bench SC1/SC2 | Available |
| Wet Processing | Critical Point Dryer | Down |
| Wet Processing | General Acids/Bases Bench-Left | Available |
| Wet Processing | JST Wet Bench | Available |
| Wet Processing | Solvent Bench #1 Lift Off | Available |
| Wet Processing | Solvent Bench #1 PR Strip | Available |
| Wet Processing | Solvent Bench 2 - hot plate and workspace | Up |
| Wet Processing | Spin Dryer - Sitek | Available |
| X-Ray Analysis/Characterization | Amira - Tomography Software | Up |
| X-Ray Analysis/Characterization | Nano-CT - GE v|tome|x m 240 | Available |
| X-Ray Analysis/Characterization | Nano-CT Image Processing/Reconstruction System | Available |
| X-Ray Analysis/Characterization | Panalytical XPert MRD | Available |
| X-Ray Analysis/Characterization | Panalytical XPert Powder | Available |
| X-Ray Analysis/Characterization | Versa software workstation | Down |
| X-Ray Analysis/Characterization | Xnovo software workstation | In Use |
| X-Ray Analysis/Characterization | XRD Software Workstation | Available |
| X-Ray Analysis/Characterization | ZEISS Versa 620 XRM | Available |
