ALD - Cambridge Nano Fiji 200 - Status: Available

General Information

Current Status:

Available

Use Rates:

External Academic & Government:: $143.70/Run(24h)
External Affiliated Commercial/Industrial:: $143.70/Run(24h)
External Commercial/Industrial:: $191.60/Run(24h)
External International Academic:: $191.60/Run(24h)
Internal Standard:: $95.80/Run(24h)

Service:

Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.

Building:: NANO (0070)
Room:: Cleanroom, Film Deposition (164)
In Cleanroom:: Yes
Main Contact:: Andres Trucco

Description

Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.

Capabilities

Cambridge Nano Fiji 200 - A loadlocked ALD system with thermal and plasma deposition capabilities, 5 metal-organic precursors and up to 8" wafer sample size. The system is capable of operating in "exposure mode" which allows for deposition in high aspect ratio features.

Available Recipes: Al2O3, HfO2, AlN, Pt, Ru, TiN, TiO2, ZrO2 and SiO2.

Charge rate is per ALD run (24hr.) plus the precursor used for that run.
ALD Precursors Surcharge

Current precursors loaded:
0-H2O
1-Hf Valve open
2-Al Valve open
3-Zr Valve open
4-Si Valve open
5-Ti Valve open

NOTE: Precursor changes need to be notified 48h in advance.