Cleanroom, Film Deposition (164) Reservation Calendar

Equipment in Room: ALD - Cambridge, PECVD - STS 310PC SiO2 - SiN - Amorphous Si, PVD e-beam, Sputter Deposition, KJL, PECVD - Unaxis 790 PECVD, Sputter deposition, Evatec

Reservation buffers in effect for this room: PVD e-beam: 24 minutes, Sputter Deposition, KJL: 60 minutes, PECVD - Unaxis 790 PECVD: 30 minutes. Note: When calculating room occupancy, reservation buffers will effectively extend a reservation by the buffer amount.