Sputter Deposition, Evatec Clusterline 200 - Status: Available

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General Information

Current Status:

Available

Use Rates:

Building:

NANO (0070)

Room:

Cleanroom, Film Deposition (164)

In Cleanroom:

Yes

Main Contact:

David Hays

Description

Evatec Clusterline 200

Capabilities

Key features: Pulsed DC deposition of high quality piezoelectric films of AlN and AlScN.
Capable of substrate temperatures of 450C Designed for 6 inch wafers but can process 4inch using a pocket carrier wafer.
STAFF RUN ONLY