PECVD - Unaxis 790 PECVD - Status: Available
General Information
- Current Status:
- Available
- Use Rates:
- External Academic & Government:
- $76.50/Hour
- External Affiliated Commercial/Industrial:
- $76.50/Hour
- External Commercial/Industrial:
- $102.00/Hour
- External International Academic:
- $102.00/Hour
- Internal Standard:
- $51.00/Hour
- Service:
- Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
- Building:
- NANO (0070)
- In Cleanroom:
- Yes
- Main Contact:
- Bill Lewis
Description
Unaxis 790 PECVD - Plasma Enhanced Chemical Vapor Deposition System.
PECVD wiki link
Microfabrication wiki link
Capabilities
Deposition Capabilities: SiO2, SiN, SiC. The system is equipped with one 13.56 MHz 500 Watt RF power supply. Process Gases Available: 5%SiH4/He, N2O, NH3, N2, He, SF6, CH4. The system is capable of processing samples up to 8” diameter.
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