PECVD - STS 310PC SiO2 - SiN - Amorphous Si - Status: Available

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General Information

Current Status:

Available

Use Rates:

External Academic & Government:

$76.50/Hour

External Affiliated Commercial/Industrial:

$76.50/Hour

External Commercial/Industrial:

$102.00/Hour

External International Academic:

$102.00/Hour

Internal Standard:

$51.00/Hour

Service:

Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.

Building:

NANO (0070)

Room:

Cleanroom, Film Deposition (164)

In Cleanroom:

Yes

Main Contact:

David Hays

Description

STS 310PC - Plasma Enhanced Chemical Vapor Deposition System.

Capabilities

Description: The PECVD STS deposition tool is used for depositing silicon nitride, silicon dioxide and amorphous silicon films. The system is equipped with 13.56 MHz and 187.5 kHz frequencies and is capable of mixed frequency recipes. Process Gases Available: SiH4, N2O, NH3, N2, Ar. The temperature of the system is normally kept at 300 °C. Therefore, only the materials that are stable at these temperatures are allowed in the STS deposition system.