RIE/ICP - Trion - Status: Down
General Information
- Current Status:
- Down
- Use Rates:
- External Academic & Government:
- $76.50/Hour
- External Affiliated Commercial/Industrial:
- $76.50/Hour
- External Commercial/Industrial:
- $102.00/Hour
- External International Academic:
- $102.00/Hour
- Internal Standard:
- $51.00/Hour
- Service:
- Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
- Building:
- NANO (0070)
- In Cleanroom:
- Yes
- Main Contact:
- David Hays
Description
The Trion etcher is load lock equipped and operated via a touch screen interface. The user may employ either RIE (Reactive Ion Etching) RF power applied at the sample stage or ICP (Inductively Coupled Plasma) RF power applied at the shower head above the sample stage. The system is configured to use both chlorinated and fluorinated gases to perform a wide variety of etch recipes. The following gasses are available for use on the Trion etcher: O2, CHF3, CF4, Ar, BCl3, Cl2, and SF6.
Capabilities
The Trion etcher is load lock equipped and operated via a touch screen interface. The user may employ either RIE (Reactive Ion Etching) RF power applied at the sample stage or ICP (Inductively Coupled Plasma) RF power applied at the shower head above the sample stage. The system is configured to use both chlorinated and fluorinated gases to perform a wide variety of etch recipes. The following gasses are available for use on the Trion etcher: O2, CHF3, CF4, Ar, BCl3, Cl2, and SF6.
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