Sputter Deposition, AJA - STAFF ONLY - Status: Available

• General Information
• Prerequisites
• Calendar
• Training
• Contacts
• Documents

General Information

Current Status:

Available

Use Rates:

External Academic & Government:

$76.50/Hour

External Affiliated Commercial/Industrial:

$76.50/Hour

External Commercial/Industrial:

$102.00/Hour

External International Academic:

$102.00/Hour

Internal Standard:

$51.00/Hour

Service:

Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.

Building:

NANO (0070)

Room:

Cleanroom, Hot Processing (166)

In Cleanroom:

Yes

Main Contact:

Bill Lewis

Description

AJA Multi-Source RF and DC Sputter System

Capabilities

Key Features: Combinatorial Materials Science thin film sputtering system. 3 gas injected Magnetron sputter sources, DC, RF and load lock module. Gases available: Argon, O2 and N2

Substrate Platen: heating to 474 Deg C, sample rotation up to 15 rpm, up to 6 inch substrates, RF or DC bias sputter magnetic or nonmagnetic materials, reactive sputtering

Operation: This tool is Staff Run Only.

Available Sputter Targets (AJA): - User Owned Target, Ag, Al, Al / 2% Si, Al2O3 Reactive - 1 day advance reservation, Au, Bi2O3, Cr, Cr2O3 Reactive - 1 day advance reservation, Cu, Ge, Hf, HfO, In2O3, InGaZnO, InO/ZnO, Ir, ITO, Mo, Ni, Pd, Pt, Ru, Si - undoped, SIO2, SiO2 Reactive - 1 day advance reservation, Ta, TaN, Ti, TiB2, TiN, TiO2, TiO2 Reactive - 1 day advance reservation, W, W2B, Y2O3, ZnO, ZnO-Al2O3(98/2%), Zr, ZrB2, ZrN