Equipment by Name
To reserve equipment time, or to view more information about an equipment, click on the equipment name. Visit the Equipment Rates page for our equipment rate schedule.
| Name | Status | Keywords |
|---|---|---|
| 4 Point Probe Station | Available | Metrology |
| ALD - Cambridge Nano Fiji 200 | In Use | Film Deposition |
| ALD - Veeco Fiji 200 | In Use | Film Deposition |
| Allied Multi-prep Lapping and Polishing system | Available | Sample Preparation |
| Amerimade Bench BOE/HF | Available | Wet Processing |
| Amerimade Bench SC1/SC2 | Available | Wet Processing |
| Amira - Tomography Software | Up | X-Ray Analysis/Characterization |
| Asher - Anatech Barrel SCE600 | Available | Plasma |
| Asher - Tepla M4L | Available | Plasma |
| Autosorb iQ - Analysis (Ar, CO2, He) | In Use | Porosimetry/Porometry/Surface Area |
| Autosorb iQ - Krypton | Available | Porosimetry/Porometry/Surface Area |
| Autosorb iQ - Outgassing (monitor) | In Use | Porosimetry/Porometry/Surface Area |
| Bruker Optical Profilometer | Available | Metrology, Surface Analysis/Characterization |
| Cameca SX Five FE EPMA | Available | Electron Microscopy/Microanalysis |
| Coater - Carbon | In Use | Sample Preparation |
| Coater - Hummer V Au-Pd | Available | Sample Preparation |
| Coater - SPI Au-Pd | Available | Sample Preparation |
| Coulter LS13320 | Available | Particle Analysis/Characterization |
| Critical Point Dryer | Down | Wet Processing |
| Dessicator | Available | Other |
| Dicing Saws- ADT | Available | Dicing/Bonding |
| DRIE - Deep RIE, STS | Available | Plasma |
| DRIE - Oxford Plasma Pro | Available | Plasma |
| E-beam evaporator, PVD | Available | Film Deposition |
| EDAX EDS/EBSD on FEI Helios NanoLab 600i dual beam | Available | Electron Microscopy/Microanalysis |
| Electronic Measurement, Lakeshore 7507 | Available | Metrology |
| Ellipsometer, J.A. Woolam | Available | Metrology, Surface Analysis/Characterization |
| FIB/SEM - FEI Helios G4 PFIB CXe dual beam | In Use | Electron Microscopy/Microanalysis |
| FIB/SEM - FEI Helios NanoLab 600i dual beam | Available | Electron Microscopy/Microanalysis |
| FIB/SEM - Thermo Fisher Scios 2 dual beam | In Use | Electron Microscopy/Microanalysis |
| Flexus 2320 | Available | Metrology |
| FTIR/FTIR Microscope - ThermoFisher iS50 | Available | Spectroscopy |
| Furnace Tube, Thermcraft, General Hot Process | Available | Hot Processing |
| Furnace Tube, Tystar #1 Wet and dry Ox | Available | Hot Processing |
| General Acids/Bases Bench-Left | Available | Wet Processing |
| Heidelberg Laser Writer | In Use | Photolithography |
| Horiba microRaman | In Use | Metrology, Spectroscopy |
| JST Wet Bench | Available | Wet Processing |
| K&S 4124 Ball Bonder, Gold Ball | Available | Dicing/Bonding |
| K&S 4700 Wedge Bonder (Staff Run) | Available | Dicing/Bonding |
| Labconco Triad Freeze Dryer | Available | Sample Preparation |
| Litho Process BSC-100 Spinner | Available | Photolithography |
| Litho Process EVG Model 620 w/BSA | Available | Photolithography |
| Litho Process Karl Suss MA6 | Available | Photolithography |
| Litho Process Laurell Litho Bay & Hot Plate/Oven | Available | Photolithography |
| Litho Process Laurell Spinner E-Beam Bay & Hot Plate/Oven | Available | Photolithography |
| Litho Process Suss Delta 20 & Hot Plate | Available | Photolithography |
| Litho Process Suss Delta 80 & Hot Plate/Oven | Available | Photolithography |
| Malvern Zetasizer Ultra | Available | Particle Analysis/Characterization |
| Nano-CT - GE v|tome|x m 240 | Available | X-Ray Analysis/Characterization |
| Nano-CT Image Processing/Reconstruction System | Available | X-Ray Analysis/Characterization |
| Nikon LV100 Microscope | Available | Metrology |
| Objet 3D Printer | Available | 3D Printing |
| Oven, YES, Image Reversal/HMDS | Available | Photolithography |
| Panalytical XPert MRD | In Use | X-Ray Analysis/Characterization |
| Panalytical XPert Powder | In Use | X-Ray Analysis/Characterization |
| PDMS Process Tools - Room 235 | Available | Other |
| PDMS-Spinner | Available | Other |
| PECVD - STS 310PC SiO2 - SiN - Amorphous Si | Available | Film Deposition |
| PECVD - Unaxis 790 PECVD | Available | Film Deposition |
| Perkin-Elmer PHI 660 - AES | Available | Surface Analysis/Characterization |
| Photospectrometer, Filmetrics F40 | Available | Metrology |
| Profilometer, Dektak XT | In Use | Metrology |
| Profilometer, Tencor AS500 | Available | Metrology |
| Quantachrome PoreMaster Mercury Porosimeter | Available | Porosimetry/Porometry/Surface Area |
| Quantachrome Porometer 3g zh | Available | Porosimetry/Porometry/Surface Area |
| Raith 150, e-beam lithography | Available | Photolithography |
| Rheometer - ARES LS1 | Available | Other Analytical Techniques |
| RIE - Unaxis 790 RIE | Available | Plasma |
| RIE/ICP - Trion | Down | Plasma |
| RIE/ICP - Unaxis SLR | Available | Plasma |
| RTA, SSI Solaris 150 | Available | Hot Processing |
| RTA, Steag 100CS RTP | Down | Hot Processing |
| S/TEM - FEI Talos F200i | Available | Electron Microscopy/Microanalysis |
| S/TEM - FEI Tecnai F20 | Down | Electron Microscopy/Microanalysis |
| S/TEM - FEI Themis Z | Down | Electron Microscopy/Microanalysis |
| SCS Parylene Coater | Down | Film Deposition |
| SEM - FEI Nova 430 w/EDS & CL | In Use | Electron Microscopy/Microanalysis, Spectroscopy |
| SEM - Hitachi S-3000 | Down | Electron Microscopy/Microanalysis |
| SEM - JEOL 5700 | Available | Metrology |
| SEM - Tescan MIRA3 | Available | Electron Microscopy/Microanalysis |
| Solvent Bench #1 Lift Off | Available | Wet Processing |
| Solvent Bench #1 PR Strip | Available | Wet Processing |
| Solvent Bench 2 - hot plate and workspace | Up | Wet Processing |
| Spin Dryer - Sitek | Available | Wet Processing |
| SPM/AFM Dimension 3100 | Available | Surface Analysis/Characterization |
| Sputter Deposition, AJA - STAFF ONLY | Available | Film Deposition |
| Sputter Deposition, Evatec Clusterline 200 | Available | Film Deposition |
| Sputter Deposition, KJL CMS-18 Multi-Source | In Use | Film Deposition |
| Sputter Deposition, TFE Batch Vertical PVD | In Use | Film Deposition |
| Struers Tegramin 30 Polisher | Available | Sample Preparation |
| TSI PSD 3603 (Aerosizer) | Down | Particle Analysis/Characterization |
| UV/Vis - Perkin-Elmer Lambda 800 | Available | Spectroscopy |
| Versa software workstation | Down | X-Ray Analysis/Characterization |
| Wafer Bonder, EVG 501 | Available | Dicing/Bonding |
| Xnovo software workstation | In Use | X-Ray Analysis/Characterization |
| XPS - ULVAC-PHI XPS | Available | Surface Analysis/Characterization |
| XRD Software Workstation | Available | X-Ray Analysis/Characterization |
| Zeiss Microscope | Available | Metrology |
| ZEISS Versa 620 XRM | In Use | X-Ray Analysis/Characterization |
