PECVD - STS 310PC SiO2 - SiN - Amorphous Si - Status: Available
  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $74.25/Hour
    • External Affiliated Commercial/Industrial: $74.25/Hour
    • External Commercial/Industrial: $99.00/Hour
    • External International Academic: $99.00/Hour
    • Internal Standard: $49.50/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: David Hays
 STS 310PC - Plasma Enhanced Chemical Vapor Deposition System.

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Description: The PECVD STS deposition tool is used for depositing silicon nitride, silicon dioxide and amorphous silicon films. The system is equipped with 13.56 MHz and 187.5 kHz frequencies and is capable of mixed frequency recipes. Process Gases Available: SiH4, N2O, NH3, N2, Ar. The temperature of the system is normally kept at 300 °C. Therefore, only the materials that are stable at these temperatures are allowed in the STS deposition system.

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