Asher - Tepla M4L - Status: Down
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The MetroLine/IPC M4L Plasma Processing System is a batch-mode plasma system for etch, strip,clean, and surface treatment.
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Gases include Oxygen, CF4 and Argon. The M4L generates a low pressure, low temperature gaseous plasma. Up to 600W RF energy is applied to a set of electrodes to separate some of the gas molecules inside the chamber into chemically reactive atoms, ions, and free radicals.
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