Sputter Deposition, AJA - STAFF ONLY - Status: Available
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AJA Multi-Source RF and DC Sputter System
Sputter Deposition wiki link Microfabrication wiki link |
Key Features:
Combinatorial Materials Science thin film sputtering system.
3 gas injected Magnetron sputter sources, DC, RF and load lock module.
Gases available: Argon, O2 and N2
Substrate Platen: heating to 474 Deg C, sample rotation up to 15 rpm, up to 6 inch substrates, RF or DC bias
sputter magnetic or nonmagnetic materials, reactive sputtering
Operation: This tool is Staff Run Only.
Available Sputter Targets (AJA): - User Owned Target, Ag, Al, Al / 2% Si, Al2O3 Reactive - 1 day advance reservation, Au, Bi2O3, Cr, Cr2O3 Reactive - 1 day advance reservation, Cu, Ge, Hf, HfO, In2O3, InGaZnO, InO/ZnO, Ir, ITO, Mo, Ni, Pd, Pt, Ru, Si - undoped, SIO2, SiO2 Reactive - 1 day advance reservation, Ta, TaN, Ti, TiB2, TiN, TiO2, TiO2 Reactive - 1 day advance reservation, W, W2B, Y2O3, ZnO, ZnO-Al2O3(98/2%), Zr, ZrB2, ZrN
An active Gatorlink login is required to create a new reservation.