Sputter Deposition, AJA - STAFF ONLY - Status: Available
|
AJA Multi-Source RF and DC Sputter System
Sputter Deposition wiki link Microfabrication wiki link |
Key Features:
Combinatorial Materials Science thin film sputtering system.
3 gas injected Magnetron sputter sources, DC, RF and load lock module.
Gases available: Argon, O2 and N2
Substrate Platen: heating to 474 Deg C, sample rotation up to 15 rpm, up to 6 inch substrates, RF or DC bias
sputter magnetic or nonmagnetic materials, reactive sputtering
Operation: This tool is Staff Run Only.
An active Gatorlink login is required to create a new reservation.