PECVD - Unaxis 790 PECVD - Status: Available
  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $74.25/Hour
    • External Affiliated Commercial/Industrial: $74.25/Hour
    • External Commercial/Industrial: $99.00/Hour
    • External International Academic: $99.00/Hour
    • Internal Standard: $49.50/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Bill Lewis
 Unaxis 790 PECVD - Plasma Enhanced Chemical Vapor Deposition System.

PECVD wiki link
Microfabrication wiki link
Capabilities Training Prerequisites Calendar Contacts Docs

Deposition Capabilities: SiO2, SiN, SiC. The system is equipped with one 13.56 MHz 500 Watt RF power supply. Process Gases Available: 5%SiH4/He, N2O, NH3, N2, He, SF6, CH4. The system is capable of processing samples up to 8” diameter.

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