Key Features: Combinatorial Materials Science thin film sputtering system 4 gas injected Magnetron sputter sources, DC, RF and load lock module with rack-and-pinion transfer Substrate Platen: heating to 550 Deg C for 4" wafer, 360 Deg C for sample holder mounted substrate, rotation up to 40 rpm, up to 6” substrates, RF or DC bias sputter magnetic or nonmagnetic materials, reactive sputtering Operation: Manual or full Auto via process control process recipe Software---Windows-based, I/O subsystem, automatic process controller with GUI Unlimited user recipe management Gases available: Argon, O2 and N2

RESERVATION POLICY:

Reservations must be made at least 4 hours in advance. For same day reservations, you must talk directly on the telephone with NRF Staff Member for approval. Next day reservations made after 3PM may not be loaded until 10AM the next day.
If your target does not get loaded, cancel/change your reservation and email NRF Staff to avoid missed reservation fee.

REACTIVE SPUTTER RESERVATION POLICY:
Reactive requires that the target be loaded overnight.

Reactive sputter reservations require 2 steps:
Step 1 – Contact Marco Downing, Bill Lewis or David Hays (cell phone or text) and arrange for the target to be loaded one day before your reservation. Bill or David will let you know at that time when to reserve the tool.
Step 2 – Reserve the tool per NRF Staff Instruction. FYI- the reservation will usually be between 8-10AM

Sputter Consumables Surcharge

Available Sputter Targets: - User Owned Target, Ag, Al, Al / 2% Si, Al2O3 Reactive - 1 day advance reservation, Au, Bi2O3, Cr, Cr2O3 Reactive - 1 day advance reservation, Cu, Ge, Hf, HfO, In2O3, InGaZnO, InO/ZnO, Ir, ITO, Mo, Ni, Pd, Pt, Ru, Si - undoped, SIO2, SiO2 Reactive - 1 day advance reservation, Ta, TaN, Ti, TiB2, TiN, TiO2, TiO2 Reactive - 1 day advance reservation, W, W2B, Y2O3, ZnO, ZnO-Al2O3(98/2%), Zr, ZrB2, ZrN

An active Gatorlink login is required to create a new reservation.