Open House 2024 Weekly Update

Sputter Deposition, KJL CMS-18 Multi-Source - Status: Available

  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $76.50/Hour
    • External Affiliated Commercial/Industrial: $76.50/Hour
    • External Commercial/Industrial: $102.00/Hour
    • External International Academic: $102.00/Hour
    • Internal Standard: $51.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Marco Downing
Kurt J. Lesker Multi-Source RF and DC Sputter System.

Sputter Deposition wiki link
Microfabrication wiki link

Key Features: Combinatorial Materials Science thin film sputtering system 4 gas injected Magnetron sputter sources, DC, RF and load lock module with rack-and-pinion transfer Substrate Platen: heating to 550 Deg C for 4" wafer, 360 Deg C for sample holder mounted substrate, rotation up to 40 rpm, up to 6” substrates, RF or DC bias sputter magnetic or nonmagnetic materials, reactive sputtering Operation: Manual or full Auto via process control process recipe Software---Windows-based, I/O subsystem, automatic process controller with GUI Unlimited user recipe management Gases available: Argon, O2 and N2

RESERVATION POLICY:

Reservations must be made at least 4 hours in advance. For same day reservations, you must talk directly on the telephone with NRF Staff Member for approval. Next day reservations made after 3PM may not be loaded until 10AM the next day.
Use the "Status Log" (see the menu above) to see what targets are presently loaded. If your target does not get loaded, cancel/change your reservation and email NRF Staff to avoid missed reservation fee.

REACTIVE SPUTTER RESERVATION PROCEDURE:
Reactive sputtering requires that the target be loaded one day in advance to obtain better that usual chamber pressure.
Reactive sputter reservation procedure :
Send email request to Marco Downing, Bill Lewis and David Hays. Include the date you would prefer to do the reactive deposition. Staff will verify that the target material can be loaded and Staff will make BOTH reservations for you. The actual date reserved for you by Staff may be different depending on availability. You will receive an email from Staff regarding the day the tool will be ready. The reservation time will always be 8AM.
Sputter Consumables Surcharge

Available Sputter Targets (KJL): - User Owned Target, Ag, Al, Al / 2% Si, Al2O3 Reactive - 1 day advance reservation, Au, Bi2O3, Cr, Cr2O3 Reactive - 1 day advance reservation, Cu, Ge, Hf, HfO, In2O3, InGaZnO, InO/ZnO, Ir, ITO, Mo, Ni, Pd, Pt, Ru, Si - undoped, SIO2, SiO2 Reactive - 1 day advance reservation, Ta, TaN, Ti, TiB2, TiN, TiO2, TiO2 Reactive - 1 day advance reservation, W, W2B, Y2O3, ZnO, ZnO-Al2O3(98/2%), Zr, ZrB2, ZrN

An active Gatorlink login is required to create a new reservation.