Litho Process Karl Suss MA6 - Status: Available

  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $68.25/Hour
    • External Affiliated Commercial/Industrial: $68.25/Hour
    • External Commercial/Industrial: $91.00/Hour
    • External International Academic: $91.00/Hour
    • Internal Standard: $45.50/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Photolithography (165)
  • In Cleanroom: Yes
  • Main Contact: Bill Lewis
Description: The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer (sample) 1:1 contact printing in four modes; hard contact, soft contact, vacuum and proximity. It can accommodate exposure of irregularly shaped substrates and standard wafers to 6”. Features: Contact 1:1 aligner. DUV and IR capability Approximate Exposure Intensity: 8 mW/cm2@365 nm, 5 mW/cm2@405 nm Constant exposure intensity controller Two mask holder sizes are available, 4" and 5". Wafer size is 4" and pieces. Maximum wafer thickness 4.3mm Split field microscope for top-side viewing/alignment. resolution = down to .8um in vacuum contact mode @ 400nm

The use of the developer station (not tracked/charged) is built into the charge rate.

Photolithography wiki link
Photoresist wiki link
Microfabrication wiki link
Training TopicDescriptionRatesApprox Session Length (hrs)
Mask Aligner Karl Suss MA6 TrainingStandard Rate: $46.00/Complete User Training2
StartEndAvailabilityLocation
Fri, Dec. 20, 2024 1:30 PMFri, Dec. 20, 2024 3:30 PM1 Seats out of 1NRFSign Up
Mon, Dec. 30, 2024 9:00 AMMon, Dec. 30, 2024 11:00 AM1 Seats out of 1NRFSign Up
Fri, Jan. 17, 2025 1:30 PMFri, Jan. 17, 2025 3:30 PM1 Seats out of 1NRFSign Up
Mon, Jan. 27, 2025 9:00 AMMon, Jan. 27, 2025 11:00 AM1 Seats out of 1NRFSign Up
Mon, Feb. 10, 2025 9:00 AMMon, Feb. 10, 2025 11:00 AM1 Seats out of 1NRFSign Up

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