Litho Process Karl Suss MA6 - Status: Down
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Description: The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer (sample) 1:1 contact printing in four modes; hard contact, soft contact, vacuum and proximity. It can accommodate exposure of irregularly shaped substrates and standard wafers to 6”.
Features:
Contact 1:1 aligner.
DUV and IR capability
Approximate Exposure Intensity: 8 mW/cm2@365 nm, 5 mW/cm2@405 nm
Constant exposure intensity controller
Two mask holder sizes are available, 4" and 5".
Wafer size is 4" and pieces.
Maximum wafer thickness 4.3mm
Split field microscope for top-side viewing/alignment.
resolution = down to .8um in vacuum contact mode @ 400nm
The use of the developer station (not tracked/charged) is built into the charge rate. Photolithography wiki link Photoresist wiki link Microfabrication wiki link |
| Training Topic | Description | Rates | Approx Session Length (hrs) |
|---|---|---|---|
| Mask Aligner Karl Suss MA6 Training | Standard Rate: $46.00/Complete User Training | 2 |
| Start | End | Availability | Location | |
|---|---|---|---|---|
| Mon, Dec. 30, 2024 9:00 AM | Mon, Dec. 30, 2024 11:00 AM | 1 Seats out of 1 | NRF | Sign Up |
| Fri, Jan. 17, 2025 1:30 PM | Fri, Jan. 17, 2025 3:30 PM | 1 Seats out of 1 | NRF | Sign Up |
| Mon, Jan. 27, 2025 9:00 AM | Mon, Jan. 27, 2025 11:00 AM | 1 Seats out of 1 | NRF | Sign Up |
| Mon, Feb. 10, 2025 9:00 AM | Mon, Feb. 10, 2025 11:00 AM | 1 Seats out of 1 | NRF | Sign Up |
| Fri, Feb. 14, 2025 1:30 PM | Fri, Feb. 14, 2025 3:30 PM | 1 Seats out of 1 | NRF | Sign Up |
To request a training session at a custom date & time, please click an option below.
Request and Sign Up for Priority Mask Aligner Karl Suss MA6 Training
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