RIE - Unaxis 790 RIE - Status: Available
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Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials.
Features:
-Process Gases Available: CHF3, CF4, O2, He.
-Substrates up to 8" diameter
-Temperature controlled chamber
-500W RIE
-Manual wafer load.
Reactive-Ion Etching wiki link Plasma Etching wiki link Microfabrication wiki link |
| Training Topic | Description | Rates | Approx Session Length (hrs) |
|---|---|---|---|
| Unaxis 790 RIE Training | Standard Rate: $21.00/Complete User Training | 1 |
| Start | End | Availability | Location | Options |
|---|---|---|---|---|
| Tue, Nov. 18, 2025 2:00 PM | Tue, Nov. 18, 2025 3:00 PM | 1 Seats out of 1 | NRF | Sign Up |
| Thu, Nov. 27, 2025 11:00 AM | Thu, Nov. 27, 2025 12:00 PM | 1 Seats out of 1 | NRF | Sign Up |
| Tue, Dec. 16, 2025 2:00 PM | Tue, Dec. 16, 2025 3:00 PM | 1 Seats out of 1 | NRF | Sign Up |
| Thu, Dec. 25, 2025 11:00 AM | Thu, Dec. 25, 2025 12:00 PM | 1 Seats out of 1 | NRF | Sign Up |
| Tue, Jan. 13, 2026 2:00 PM | Tue, Jan. 13, 2026 3:00 PM | 1 Seats out of 1 | NRF | Sign Up |
To request a training session at a custom date & time, please click an option below.
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