RIE - Unaxis 790 RIE - Status: Available
  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $74.25/Hour
    • External Affiliated Commercial/Industrial: $74.25/Hour
    • External Commercial/Industrial: $99.00/Hour
    • External International Academic: $99.00/Hour
    • Internal Standard: $49.50/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Bio/Nano Bio Processing (163)
  • In Cleanroom: Yes
  • Main Contact: Bill Lewis
 Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.

Reactive-Ion Etching wiki link
Plasma Etching wiki link
Microfabrication wiki link
Capabilities Training Prerequisites Calendar Contacts Docs
Contact LevelNameEmail
1Lewis, Billwalewis@ufl.edu
2Hays, Daviddhays@nimet.ufl.edu

General Contact: nrfinfo@mail.ufl.edu

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