RIE - Unaxis 790 RIE - Status: In Use
  • Current Status: In Use
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $74.25/Hour
    • External Affiliated Commercial/Industrial: $74.25/Hour
    • External Commercial/Industrial: $99.00/Hour
    • External International Academic: $99.00/Hour
    • Internal Standard: $49.50/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Bio/Nano Bio Processing (163)
  • In Cleanroom: Yes
  • Main Contact: Bill Lewis
 Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.

Reactive-Ion Etching wiki link
Plasma Etching wiki link
Microfabrication wiki link
Capabilities Training Prerequisites Calendar Contacts Docs

Use Prerequisites

PrerequisiteDescriptionStatus
Computer AccessRequires computer access be setupCheck Your Status
Funding SourceRequires permission to an active funding sourceCheck Your Status
Work PlanRequires a work plan be approved by PI and staffCheck Your Status
Agreement FormRequires completed agreement form for equipment usageCheck Your Status
NRF Safety TrainingRequires completion of safety trainingCheck Your Status
NRF Building AccessRequires issue of an id badge and entry badge and/or access level to be set.Check Your Status
Equipment TrainingRequires completion of equipment trainingCheck Your Status

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