Sputter Deposition, TFE Batch Vertical PVD - Status: In Use
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The TFE ITO Sputter is a dedicated sputter tool for tuning and depositing ITO with various properties. It comes with a heated RF etch station and tune-able plasma power, plasma pressure, and plasma gas composition (Ar/O2). The tool can run up to 9 4" wafers or 4 6" wafers at a time. |
| Training Topic | Description | Rates | Approx Session Length (hrs) |
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| TFE Sputter Training | N/A |
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