Sputter Deposition, TFE Batch Vertical PVD - Status: In Use

Current Status: In Use
Training: View Topics/Sessions
Use Rates:
- External Academic & Government: $76.50/Hour
- External Affiliated Commercial/Industrial: $76.50/Hour
- External Commercial/Industrial: $102.00/Hour
- External International Academic: $102.00/Hour
- Internal Standard: $51.00/Hour
In Cleanroom: No
Main Contact: Marco Downing

The TFE ITO Sputter is a dedicated sputter tool for tuning and depositing ITO with various properties. It comes with a heated RF etch station and tune-able plasma power, plasma pressure, and plasma gas composition (Ar/O2). The tool can run up to 9 4" wafers or 4 6" wafers at a time.

Capabilities Training Prerequisites Calendar Contacts Docs

Contact Level	Name	Email
1	Downing, Marco	madowning@ufl.edu

General Contact: nrfinfo@mail.ufl.edu

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