Sputter Deposition, TFE Batch Vertical PVD - Status: In Use

Current Status: In Use
Training: View Topics/Sessions
Use Rates:
- External Academic & Government: $76.50/Hour
- External Affiliated Commercial/Industrial: $76.50/Hour
- External Commercial/Industrial: $102.00/Hour
- External International Academic: $102.00/Hour
- Internal Standard: $51.00/Hour
In Cleanroom: No
Main Contact: Marco Downing

The TFE ITO Sputter is a dedicated sputter tool for tuning and depositing ITO with various properties. It comes with a heated RF etch station and tune-able plasma power, plasma pressure, and plasma gas composition (Ar/O2). The tool can run up to 9 4" wafers or 4 6" wafers at a time.

Capabilities Training Prerequisites Calendar Contacts Docs

Use Prerequisites

Prerequisite	Description	Status
Computer Access	Requires computer access be setup	Check Your Status
Funding Source	Requires permission to an active funding source	Check Your Status
Work Plan	Requires a work plan be approved by PI and staff	Check Your Status
Agreement Form	Requires completed agreement form for equipment usage	Check Your Status
NRF Safety Training	Requires completion of safety training	Check Your Status
UF myTraining Course Completion	Requires completion of myTraining courses.	Check Your Status
NRF Building Access	Requires issue of an id badge and entry badge and/or access level to be set.	Check Your Status
Equipment Training	Requires completion of equipment training	Check Your Status

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