ALD - Cambridge Nano Fiji 200 - Status: Available
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Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.
Atomic Layer Deposition wiki link Microfabrication wiki link Plasma-ald and ALD resources |
| Title | |
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| Al2O3 uniformity data | Download |
| Al2O3 Uniformity data after chamber clean | Download |
| ALD Operation Procedure | Download |
| ALD Precursors Surcharge | Download |
| AlN uniformity | Download |
| Equipment Image | Download |
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