ALD - Cambridge Nano Fiji 200 - Status: Available
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Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.
Atomic Layer Deposition wiki link Microfabrication wiki link Plasma-ald and ALD resources |
| Contact Level | Name | |
|---|---|---|
| 1 | Trucco, Andres | andres5@ufl.edu |
| 2 | Gila, Brent | bgila@ufl.edu |
| 3 | Downing, Marco | madowning@ufl.edu |
General Contact: nrfinfo@mail.ufl.edu
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