ALD - Veeco Fiji 200 - Status: Available

Current Status: Available
Training: View Topics/Sessions
Use Rates:
- External Academic & Government: $143.70/Run(24h)
- External Affiliated Commercial/Industrial: $143.70/Run(24h)
- External Commercial/Industrial: $191.60/Run(24h)
- External International Academic: $191.60/Run(24h)
- Internal Standard: $95.80/Run(24h)
Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
Building: NANO (0070)
Room: Cleanroom, E Beam (161)
In Cleanroom: Yes
Main Contact: Marco Downing

Veeco Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.

Atomic Layer Deposition wiki link
Microfabrication wiki link
Plasma-ald and ALD resources

Capabilities Training Prerequisites Calendar Contacts Docs

Veeco Nano Fiji 200 - A loadlocked ALD system with thermal and plasma deposition capabilities, up to 8" wafer sample size. This ALD focuses on Nitrides and Metals. The system is capable of operating in "exposure mode" which allows for deposition in high aspect ratio features. There additionally is a substrate bias available for Staff-run only.

Available Recipes: AlN, TiN, Cu, Ni.

Charge rate is per ALD run (24hr.) plus the precursor used for that run.
ALD Precursors Surcharge

Current precursors loaded:
0-N/a
1-N/a
2-Ni Valve closed
3-Al Valve open
4-Cu Valve open
5-Ti Valve open

NOTE: Precursor changes need to be notified 48h in advance.

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