Material Safety Data Sheets
(Trimethyl)methylcyclopentadienylplatinum(IV), 99% |
Precursor, ALD |
777 Etch |
General |
Acetic Acid |
Acid |
Acetone |
Solvent |
Aluminum etchant 80:15:3:2 |
Pre-mixed Etch |
Ammonia (NH3) |
Gases, Pure |
Ammonium Hydroxide |
Base |
Anisole |
Solvent |
Argon (Ar) |
Gases, Pure |
AZ 400K |
Developer, Alkaline |
AZ 9260 Photoresist (520 CPS) |
Photoresists, Pos |
AZ EBR 70/30 |
Solvent |
AZ nLOF 2000 Series |
Photoresists, Neg |
AZ® 300 MIF |
Developer, Alkaline |
Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru) |
Precursor, ALD |
Boron trichloride (BCl3) |
Gases, Pure |
BTS-220 (PGMEA) |
Solvent |
Buffered oxide etch (BOE) 6:1 |
Pre-mixed Etch |
CF4 (20%) Oxygen (80%) |
Gases, Mixed |
Chlorine (Cl2) |
Gases, Pure |
Chlorobenzene |
Developer, Solvent |
Chrome etchant type 1020 |
Pre-mixed Etch |
Copper Etch APS-100 |
General |
CRF-440 |
Cleaning Solution |
Diborane (B2H6) |
Gases, Pure |
Dichlorobenzene |
Solvent |
Dichlorosilane (SiH2Cl2) |
Gases, Pure |
EBR PG |
Resist Remover |
Futurrex NR9-1500 |
Photoresists, Neg |
Gold etchant type TFA |
Pre-mixed Etch |
Helium |
Gases, Pure |
HMDS |
Adhesion Promoter |
Hydrochloric acid |
Acid |
Hydrofluoric acid |
Acid |
Hydrogen (4%) Nitrogen (96%) |
Gases, Mixed |
Hydrogen (H2) |
Gases, Pure |
Hydrogen Peroxide Solution 30% |
Oxidizer |
Isopropanol |
Solvent |
Lead zirconate titanate (PZT) |
Other Film |
ma-N 2400 Negative Tone Photoresist |
Photoresists, Neg |
Methane (CH4) |
Gases, Pure |
Methanol |
Solvent |
Methyl Isobutyl Ketone (MIBK) |
Solvent |
MIBK:IPA |
Developer, Solvent |
Microchem G-thinner |
Solvent |
Microchem LOR A |
Photoresists, Pos |
Microchem LOR B |
Photoresists, Pos |
Microchem P-thinner |
Solvent |
Microchem PMGI 101A Developer |
Developer, Solvent |
Microchem SU-8 2000 series |
Photoresists, Neg |
MICROPOSIT S1813 |
Photoresists, Pos |
Nitric Acid |
Acid |
Nitrogen (N2) |
Gases, Pure |
Nitrous Oxide (N2O) |
Gases, Pure |
Octafluorocyclobutane (C4F8) |
Gases, Pure |
Oxygen (O2) |
Gases, Pure |
PDMS - Sylgard 184 Silicone Elastomer |
General |
Pentakis(dimethylamino)tantalum(V), 99% |
Precursor, ALD |
PG Remover |
Resist Remover |
Phosphoric Acid |
Acid |
PI-2574 |
General |
PI-2611 |
General |
PMMA in Anisole |
Photoresists, Pos |
SU-8 Developer |
Developer, Solvent |
Sulfur hexafluoride (SF6) |
Gases, Pure |
Sulfuric Acid |
Acid |
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH |
Precursor, ALD |
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT |
Precursor, ALD |
Toluene |
Solvent |
Trifluoromethane (CHF3) |
Gases, Pure |
Trimethylaluminum, min. 98% |
Precursor, ALD |
Tris(dimethylamino)silane, 99+% |
Precursor, ALD |
VM651 |
Adhesion Promoter |
WL-5351 PHOTOPATTERNABLE SPIN-ON SILICONE |
General |
WL-5351 Silicone |
Photoresists, Neg |
Xylene |
Developer, Solvent |
ZEP 520A |
Photoresists, Pos |