Litho Process Suss Delta 80 & Hot Plate/Oven - Status: Available
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Description: The Litho Bay Suss Delta 80 Spinner automatically applies AZ1512 and AZ9260 photoresist. It has the unique capability of applying photoresist in a solvent rich environment; improving uniformity and extending the allowable thickness range for a single photoresist type. Other materials may be used ONLY by special request to NRF Staff.
Sample sizes: fragments <4", 4" max for round substrates, 4" max for square substrates.
Pump 1 resist = AZ 1512 photoresist
Pump 2 resist = AZ 9260 photoresist
Autosyringe dispense = available for dispensing other materials (email requests to NRF Staff)
The use of photoresist support equipment (not tracked/ charged) is built into the spinner charge rate. Support equipment includes: HMDS hotplate, soft bake hotplates, hard bake hotplates and ovens. Spin Coating wiki link Photolithography wiki link Photoresist wiki link Microfabrication wiki link |
Contact Level | Name | |
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1 | Lewis, Bill | walewis@ufl.edu |
2 | Hays, David | dhays@nimet.ufl.edu |
General Contact: nrfinfo@mail.ufl.edu
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