Raith 150, e-beam lithography - Status: Available
|
The RAITH150 is a multipurpose tool capable of direct e-beam exposure, wafer scale process development at suboptical resolution. The system includes integrated linewidth and metrology functions which give the user the ability to optimize process reproducibility. In addition the SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.
Electron Beam Lithography wiki link Photoresist wiki link E-beam resist wiki link Microfabrication wiki link This is a staff run only resource. |
No Scheduled Training Sessions are Currently Available
An active Gatorlink login is required to create a new reservation.