Litho Process EVG Model 620 w/BSA - Status: Available
|
The EVG 620 is a double-side mask aligner and it can be used for UV lithography on wafers of sizes up to 150mm.
The lamp is OFF (contact Staff if you need to use the tool) Photolithography wiki link Photoresist wiki link Microfabrication wiki link |
Contact Level | Name | |
---|---|---|
1 | Lewis, Bill | walewis@ufl.edu |
2 | Hays, David | dhays@nimet.ufl.edu |
General Contact: nrfinfo@mail.ufl.edu
An active Gatorlink login is required to create a new reservation.