Raith ionLiNE - multi-species FIB - Status: No Longer Available
General Information
- Current Status:
- No Longer Available
- Use Rates:
- External Academic & Government:
- $60.00/Hour
- External Affiliated Commercial/Industrial:
- $60.00/Hour
- External Commercial/Industrial:
- $80.00/Hour
- External International Academic:
- $80.00/Hour
- Internal Standard:
- $40.00/Hour
- Service:
- Request Service Quote. The Staff rate is $50/hour
- Building:
- NANO (0070)
- Room:
- Dual-Beam Fib (132)
- In Cleanroom:
- No
- Main Contact:
- Brent Gila
Description
The Raith ionLiNE is a focused ion beam (FIB) lithography system with an alloy ion source. It can process samples up to 4" diameter.
Ion Beam Lithography wiki link
Focused Ion Beam wiki link
Microfabrication wiki link
This is a staff run only resource.
Capabilities
The Raith ionLiNE is a focused ion beam (FIB) lithography system with a Liquid Metal Alloy Ion Source (LMAIS)rather than traditional Ga for exposure, milling, and implantation.
Capabilities include:
- up to a 4" sample size
- nanometer stage control and accuracy
- 15-40kV column acceleration
- Gas Injection (GIS) with precursors for PT, W, C, XeF2, H2O
- GDSII editor
Currently loaded LMAIS: AuSi
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