NANOSCALE RESEARCH FACILITY

A College of Engineering Research Service Center - NRF / MAIC&PAIC

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Material Safety Data Sheets

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Name Type
777 Etch General
Acetic Acid Acid
Acetone Solvent
Aluminum etchant 80:15:3:2 Pre-mixed Etch
Ammonia (NH3) Gases, Pure
Ammonium Hydroxide Base
Anisole Solvent
Argon (Ar) Gases, Pure
AZ 400K Developer, Alkaline
AZ 9260 Photoresist (520 CPS) Photoresists, Pos
AZ nLOF 2000 Series Photoresists, Neg
AZ® 300 MIF Developer, Alkaline
Boron trichloride (BCl3) Gases, Pure
BTS-220 (PGMEA) Solvent
Buffered oxide etch (BOE) 6:1 Pre-mixed Etch
CF4 (20%) Oxygen (80%) Gases, Mixed
Chlorine (Cl2) Gases, Pure
Chlorobenzene Developer, Solvent
Chrome etchant type 1020 Pre-mixed Etch
Copper Etch APS-100 General
CRF-440 Cleaning Solution
Diborane (B2H6) Gases, Pure
Dichlorobenzene Solvent
Dichlorosilane (SiH2Cl2) Gases, Pure
EBR PG Resist Remover
Futurrex NR9-1500 Photoresists, Neg
Gold etchant type TFA Pre-mixed Etch
Helium Gases, Pure
HMDS Adhesion Promoter
Hydrochloric acid Acid
Hydrofluoric acid Acid
Hydrogen (4%) Nitrogen (96%) Gases, Mixed
Hydrogen (H2) Gases, Pure
Hydrogen Peroxide Solution 30% Oxidizer
Isopropanol Solvent
Lead zirconate titanate (PZT) Other Film
Methane (CH4) Gases, Pure
Methanol Solvent
Methyl Isobutyl Ketone (MIBK) Solvent
MIBK:IPA Developer, Solvent
Microchem G-thinner Solvent
Microchem LOR A Photoresists, Pos
Microchem LOR B Photoresists, Pos
Microchem P-thinner Solvent
Microchem SU-8 2000 series Photoresists, Neg
MICROPOSIT S1813 Photoresists, Pos
Nitric Acid Acid
Nitrogen (N2) Gases, Pure
Nitrous Oxide (N2O) Gases, Pure
Octafluorocyclobutane (C4F8) Gases, Pure
Oxygen (O2) Gases, Pure
PDMS - Sylgard 184 Silicone Elastomer General
PG Remover Resist Remover
Phosphoric Acid Acid
PI-2574 General
PI-2611 General
PMMA in Anisole Photoresists, Pos
SU-8 Developer Developer, Solvent
Sulfur hexafluoride (SF6) Gases, Pure
Sulfuric Acid Acid
Toluene Solvent
Trifluoromethane (CHF3) Gases, Pure
VM651 Adhesion Promoter
WL-5351 PHOTOPATTERNABLE SPIN-ON SILICONE General
WL-5351 Silicone Photoresists, Neg
Xylene Developer, Solvent
ZEP 520A Photoresists, Pos