NANOSCALE RESEARCH FACILITY

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Material Safety Data Sheets

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Name Type
Isopropanol Solvent
Methanol Solvent
Nitrogen (N2) Gases, Pure
Ammonia (NH3) Gases, Pure
Nitrous Oxide (N2O) Gases, Pure
Acetic Acid Acid
Toluene Solvent
Hydrofluoric acid Acid
Hydrochloric acid Acid
Ammonium Hydroxide Base
Anisole Solvent
AZ® 300 MIF Developer, Alkaline
AZ 400K Developer, Alkaline
Buffered oxide etch (BOE) 6:1 Pre-mixed Etch
EBR PG Resist Remover
HMDS Adhesion Promoter
Hydrogen Peroxide Solution 30% Oxidizer
Microchem LOR A Photoresists, Pos
PMMA in Anisole Photoresists, Pos
Lead zirconate titanate (PZT) Other Film
MICROPOSIT S1813 Photoresists, Pos
Microchem SU-8 2000 series Photoresists, Neg
Sulfuric Acid Acid
ZEP 520A Photoresists, Pos
AZ 9260 Photoresist (520 CPS) Photoresists, Pos
Microchem LOR B Photoresists, Pos
AZ nLOF 2000 Series Photoresists, Neg
Futurrex NR9-1500 Photoresists, Neg
WL-5351 Silicone Photoresists, Neg
VM651 Adhesion Promoter
Chlorobenzene Developer, Solvent
MIBK:IPA Developer, Solvent
SU-8 Developer Developer, Solvent
Xylene Developer, Solvent
PG Remover Resist Remover
Aluminum etchant 80:15:3:2 Pre-mixed Etch
Gold etchant type TFA Pre-mixed Etch
Chrome etchant type 1020 Pre-mixed Etch
Nitric Acid Acid
Phosphoric Acid Acid
Methyl Isobutyl Ketone (MIBK) Solvent
Microchem G-thinner Solvent
Microchem P-thinner Solvent
BTS-220 (PGMEA) Solvent
CRF-440 Cleaning Solution
Boron trichloride (BCl3) Gases, Pure
Chlorine (Cl2) Gases, Pure
Diborane (B2H6) Gases, Pure
Dichlorosilane (SiH2Cl2) Gases, Pure
Hydrogen (H2) Gases, Pure
Methane (CH4) Gases, Pure
Octafluorocyclobutane (C4F8) Gases, Pure
Oxygen (O2) Gases, Pure
Sulfur hexafluoride (SF6) Gases, Pure
Trifluoromethane (CHF3) Gases, Pure
CF4 (20%) Oxygen (80%) Gases, Mixed
Hydrogen (4%) Nitrogen (96%) Gases, Mixed
Dichlorobenzene Solvent
777 Etch General
PI-2611 General
WL-5351 PHOTOPATTERNABLE SPIN-ON SILICONE General
PI-2574 General
PDMS - Sylgard 184 Silicone Elastomer General
Copper Etch APS-100 General
ma-N 2400 Negative Tone Photoresist Photoresists, Neg
Microchem PMGI 101A Developer Developer, Solvent
Tris(dimethylamino)silane, 99+% Precursor, ALD
Trimethylaluminum, min. 98% Precursor, ALD
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT Precursor, ALD
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH Precursor, ALD
Pentakis(dimethylamino)tantalum(V), 99% Precursor, ALD
Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru) Precursor, ALD
(Trimethyl)methylcyclopentadienylplatinum(IV), 99% Precursor, ALD
Acetone Solvent
Argon (Ar) Gases, Pure
Helium Gases, Pure